Spectrum

Spectroscopic Ellipsometry Testing Services | Thin Film Thickness & n/k Analysis | Jituotech

Expert spectroscopic ellipsometry services for precise characterization of thin films. We provide accurate measurements of thickness (sub-nanometer to microns) and optical constants (n & k). Applications include semiconductors, coatings, and nanotechnology.

椭偏仪测试-上海剂拓科技

Principle of Ellipsometer

An ellipsometer is an optical measuring device used to detect film thickness, optical constants, and microstructural properties of materials. The principle is as follows: when elliptically polarized light with a known polarization state is incident on the surface of a sample, the polarization state of the reflected light is measured, and the material properties are calculated or fitted based on this information.

Instrument Models and Parameters

  • Instrument Model: ME-L Mueller Matrix Spectroscopic Ellipsometer
  • Technical Parameters:
    • Analysis Spectrum: 210–1000 nm
    • Repeatability: 0.005 nm

Sample Submission Requirements and Precautions

  • Sample size: Length 3–10 cm, width 3–10 cm, thickness < 1 mm

Testing Examples

Reference Standards

  • SEMI M91-0319: Standard Test Method for Measurement of Silicon Oxide Thickness by Ellipsometry
  • ASTM F2864-18: Standard Test Method for Measurement of Thin Film Thickness and Optical Constants by Variable Angle Spectroscopic Ellipsometry
  • ASTM D4146-15: Standard Practice for Ellipsometric Measurements of Optical Properties of Solid Materials
  • ISO 15031-7:2000: Road Vehicles — Electrical and Electronic Equipment for Vehicles — Part 7: Test Methods for Optical Properties